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Published online by Cambridge University Press: 16 February 2011
Films of amorphous carbon (a-C) and hydrogenated amorphous carbon (a-C:H) are deposited by R.F. Magnetron Sputtering and Sputter Assisted Plasma CVD respectively and their properties are compared. It is found that high optical gap, high resistivity a-C can be obtained, so indicating a large amount of sp 3 bonded C atoms. For this reason attention was mainly focused on a-C and possible application were considered.