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Diamond Chemical Vapor Deposition: Gas Compositions and film Properties

Published online by Cambridge University Press:  21 February 2011

Peter K. Bachmann ,
Hans-Jürgen Hagemann ,
Hartmut Lade ,
Dieter Leers ,
Frederike Picht ,
Detlef U. Wiechert  and
Howard Wilson
Peter K. Bachmann
Affiliation:
Philips Research Laboratories, P.O. Box 1980, D-52021 Aachen, Germany.
Hans-Jürgen Hagemann
Affiliation:
Philips Research Laboratories, P.O. Box 1980, D-52021 Aachen, Germany.
Hartmut Lade
Affiliation:
Philips Research Laboratories, P.O. Box 1980, D-52021 Aachen, Germany.
Dieter Leers
Affiliation:
Philips Research Laboratories, P.O. Box 1980, D-52021 Aachen, Germany.
Frederike Picht
Affiliation:
Philips Research Laboratories, P.O. Box 1980, D-52021 Aachen, Germany.
Detlef U. Wiechert
Affiliation:
Philips Research Laboratories, P.O. Box 1980, D-52021 Aachen, Germany.
Howard Wilson
Affiliation:
Philips Research Laboratories, P.O. Box 1980, D-52021 Aachen, Germany.
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Abstract

Rate, crystallinity and phase purity of vapor-grown diamond deposits are discussed. Emphasis is on microwave plasma CVD of diamond from C/H-, C/H/O-, C/H/F-, C/H/CI- and C/H/N-gas mixtures.

The manufacture of wear-resistant diamond thin films, diamond vacuum window membranes and thick diamond heat spreader plates are used as examples to outline the influence of various deposition parameters on the performance of finished products and to describe the use of ternary gas phase compositional diagrams as tools for minimization of deposition technology and product optimization efforts.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 339: Symposium D – Diamond, Silicon Carbide and Nitride Wide Bandgap Semiconductors , 1994 , 267
Copyright
Copyright © Materials Research Society 1994

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References

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