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Diagnostics, Mechanisms of Deposition, and Process Control of Thin Fluoropolymeric Films in RF Discharges

Published online by Cambridge University Press:  15 February 2011

R. d'Agostino
R. d'Agostino*
Affiliation:
Centro di Studio per la Chimica dei Plasmi, Department of Chemistry, University of Bari via Orabona 4, 70126 Bari, Italy, dagostino@area.ba.cnr.it
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Abstract

Plasma deposited fluoropolymer films are shown to have composition, chemical structures and properties variable continuously in a very broad range. Films obtained under high fragmentation and structure retention conditions are discussed and compared. The mechanism of deposition is shown to explain etching-deposition competition. Finally, actinometric spectroscopy is discussed briefly as a semi-quantitative diagnostics tool enabling the control of the chemistry of the process under high fragmentation conditions‥

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Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 476: Symposium N – Low-Dielectric Constant Materials III , 1997 , 185
Copyright
Copyright © Materials Research Society 1997

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References

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