Hostname: page-component-745bb68f8f-g4j75 Total loading time: 0 Render date: 2025-02-04T16:48:47.621Z Has data issue: false hasContentIssue false
  • English
  • Français

Deposition of Heterogeneous Silicon Thin Films-Structure and Electric States-

Published online by Cambridge University Press:  17 March 2011

Isamu Shimizu
Isamu Shimizu*
Affiliation:
The InterdisciplinaryGraduate School of Science & Engineering, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama, Japan
Get access

Abstract

Heterogeneous silicon thin films exhibited various microstructures were prepared by plasma enhanced(PE)-CVD from gaseous mixture of SiF4+H2 (SiH4) on glass substrate. Efficient parameters for controlling the microstructures were reviewed together with the way to grow crystalline seeds on glass by repeating the deposition and etching. Two step growth where polycrystalline silicon thin films were epitaxially grown on the seeds made on glass was proposed to accelerated the growth rate. The relationship between the microstructure and the carrier-transport properties are addressed, as well.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 609: Symposium A – Amorphous & Heterogeneous Silicon Thin Films – 2000 , 2000 , A32.1
Copyright
Copyright © Materials Research Society 2000

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1] Meier, J., Flckiger, R., Keppner, H., and Shar, A.: Appl.Phys.Lett.,65(1994)860 Google Scholar
[2] Serikawa, T. et al. ,:IEEE Trans.Electron Devices ED–36(1989)1929 Google Scholar
[3] Yamamoto, K. et al. ,:MRS Symp.Proc. 507(1998)131 Google Scholar
[4] Nagahara, T. et al. :Jpn.J.Appl.Phys.,31(1992)4555 Google Scholar
[5] Nakata, M. et al. :Phil.Mag.,B63(1991)87 Google Scholar
[6] Kamiya, T., Nakahata, K., Ro, K., Fortmann, C.M., and Shimizu, I.: Jpn.J.Appl.Phys.,337 (1999)18 Google Scholar
[7] Shibata, N. et al. ,:MRS Symp.Proc.,95(1987)225 Google Scholar
[8] Akasaka, T. and Shimizu, I.: Appl.Phys.Lett.,66(1995)3441 Google Scholar
[9] Makin, D., Stoemenos, J., Migliorato, P., and Economou, N.A.: J.Appl.Phys.,61(1987) 5031 Google Scholar
[10] Drosd, R. and Washbrun, J.: J.Appl.Phys.,53(1982)397 Google Scholar
[11] Kamiya, T., Nakahata, K., Miida, A., Maeda, Y., Fortmann, C.M., and Shimizu, I.: Thin Solid Films 337(1999)18 Google Scholar
[12] Ro, K., Nakahata, K., Kamiya, T., Fortmann, C.M., and Shimizu, I.: J.Non-cryst.Solids, (inpress)Google Scholar
[13] Kamiya, T., Nakahata, K., Ro, K., Fortmann, C.M., and Shimizu, I.: Jpn.J.Appl.Phys., 38 (1999)5750 Google Scholar
[14] Akasaka, T., He, D., Miyamoto, Y., Kitazawa, N., and Shimizu, I.: Thin Solid Films 296 (1997)2 Google Scholar
[15] Suemasu, A., Nakahata, K., Ro, K., Kamiya, T., Fortmann, C.M., and Shimizu, I.: Solar Energy Matrials and Solar Cells (in press)Google Scholar