Hostname: page-component-745bb68f8f-f46jp Total loading time: 0 Render date: 2025-02-10T09:31:57.148Z Has data issue: false hasContentIssue false
  • English
  • Français

Control of Etching of LiNbO3, by Implant Damage Profile Tailoring

Published online by Cambridge University Press:  26 February 2011

P. J. Brannon ,
C. I. H. Ashby  and
G. W. Arnold
P. J. Brannon
Affiliation:
Sandia National Laboratories, Albuquerque, NM 87185–5800
C. I. H. Ashby
Affiliation:
Sandia National Laboratories, Albuquerque, NM 87185–5800
G. W. Arnold
Affiliation:
Sandia National Laboratories, Albuquerque, NM 87185–5800
Get access

Abstract

Damage-profile tailoring using multi-energy ion implants can produce smooth side walls and deeper etched features with ion-bombardment-enhanced wet etching of LiNb03 than is possible with a single-energy implant. High ion fluences can produce buried microcracks which may contribute to propagation losses commonly observed in ion-implanted waveguides.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 101: Symposium B – Laser and Particle-Beam Chemical Processing for Microelectronics , 1987 , 469
Copyright
Copyright © Materials Research Society 1998

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1 Kawabe, M., Hirata, S., Masuda, K., and Namba, S., J. Vac. Sci. Technol. 15, 1098 (1978).Google Scholar
2 Kawabe, M., Hirata, S., and Namba, S., IEEE Trans. Circuits and Sys. CAS–26. 1109 (1979).Google Scholar
3 Gotz, G. and Karge, H., Nuci. Instrum. Methods 209/210. 1079 (1983).Google Scholar
4 Ziegler, J.F., Biersack, J. P., and Littmark, U., The Stopping and Range of Ions in Solids. Vol. 1, edited by Ziegler, J. F. (Pergamon Press, New York, 1985).Google Scholar
5 Naden, J. M. and Weiss, B. L., J. of Lightwave Tech. LT–3. 855 (1985).Google Scholar