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Published online by Cambridge University Press: 28 February 2011
We report on measurements of conduction, threshold switching and high frecuency oscillations (∼100 MHZ) on amorphous silicon prgduced by RF sputtering in lateral devices with a very small (4µm2 to 40µm2 ) metalic contact area. The results show that the mechanism of threshold switching in this material is not due to the formation of a metalic filament through diffusion of the contacts. A small amount of Hydrogen (PH2/PAr=0.025) is sufficient to inhibit threshold switching. The “Zero voltage” resistance is reproducible and seems to be independent of the switching events.