Published online by Cambridge University Press: 26 February 2011
Implantation of 4OkeV P+ ions into high purity Ni was employed at room temperature to a dose of 3×10E17 ions/cm2 to produce an 1100 A thick amorphous surface alloy of Ni-14 wt% P. Commercially available melt spun metallic glass ribbons of nominal composition, Ni-il wt% P were used for comparison of crystallization behaviour studied with TEM and RBS techniques. The DTA analysis was employed to construct a TTT curve for the melt spun glass, which was then used as a guide for selecting time and temperature of crystallization of the implanted amorphous alloy. The melt implanted glass is found to be less stable and crystallizes more readily than melt spun glass of similar composition. A detailed study on nucleation and growth of crystallites, mode of crystallization and effect of surface proximity will be presented.