Crossref Citations
This article has been cited by the following publications. This list is generated based on data provided by
Crossref.
Kotomin, E. A.
and
Shluger, A. L.
1989.
Quantum-chemical approach to defect formation processes in non-metallic crystals.
Radiation Effects and Defects in Solids,
Vol. 111-112,
Issue. 1-2,
p.
177.
Needels, M.
Joannopoulos, J.D.
BAR-YAM, Y.
Pantelides, S.T.
and
WOLFE, R.H.
1990.
The Enchanting Properties of Oxygen Atoms in Silicon.
MRS Proceedings,
Vol. 209,
Issue. ,
Estreicher, Stefan K.
1990.
Interstitial O in Si and its interactions with H.
Physical Review B,
Vol. 41,
Issue. 14,
p.
9886.
Needels, M.
Joannopoulos, J. D.
Bar-Yam, Y.
and
Pantelides, S. T.
1991.
Oxygen complexes in silicon.
Physical Review B,
Vol. 43,
Issue. 5,
p.
4208.
Newman, R.C.
and
Jones, R.
1994.
Vol. 42,
Issue. ,
p.
289.
Jiang, Z.
and
Brown, R. A.
1995.
Study of Oxygen Diffusion and Clustering in Silicon Using an Empirical Interatomic Potential.
MRS Proceedings,
Vol. 378,
Issue. ,
Jiang, Z.
and
Brown, R. A.
1995.
Atomistic Calculation of Oxygen Diffusivity in Crystalline Silicon.
Physical Review Letters,
Vol. 74,
Issue. 11,
p.
2046.
Ramamoorthy, Madhavan
and
Pantelides, Sokrates T.
1996.
Coupled-Barrier Diffusion: The Case of Oxygen in Silicon.
Physical Review Letters,
Vol. 76,
Issue. 2,
p.
267.
Pantelides, S. T.
and
Ramamoorthy, M.
1997.
Atomic Dynamics During Silicon Oxidation and the Nature of Defects at the Si-SiO2 Interface.
MRS Proceedings,
Vol. 490,
Issue. ,
Pantelides, Sokrates T
and
Ramamoorthy, Madhavan
1999.
Atomic-scale dynamics during silicon oxidation and the properties of defects at the Si–SiO2 interface.
Journal of Non-Crystalline Solids,
Vol. 254,
Issue. 1-3,
p.
38.
Ramamoorthy, M.
and
Pantelides, S. T.
1999.
Atomic dynamics and defect evolution during oxygen precipitation and oxidation of silicon.
Applied Physics Letters,
Vol. 75,
Issue. 1,
p.
115.
Jones, R.
Coutinho, J.
Öberg, S.
and
Briddon, P.R.
2001.
Thermal double donors in Si and Ge.
Physica B: Condensed Matter,
Vol. 308-310,
Issue. ,
p.
8.
Rashkeev, S. N.
Di Ventra, M.
and
Pantelides, S. T.
2001.
Hydrogen passivation and activation of oxygen complexes in silicon.
Applied Physics Letters,
Vol. 78,
Issue. 11,
p.
1571.
Kageshima, H
Taguchi, A
and
Wada, K
2003.
Formation of stable N–V–O complexes in Si.
Physica B: Condensed Matter,
Vol. 340-342,
Issue. ,
p.
626.
Gusakov, Vasilii
2005.
General Model of Diffusion of Interstitial Oxygen in Silicon and Germanium Crystals.
MRS Proceedings,
Vol. 864,
Issue. ,
Gusakov, Vasilii E.
2005.
General Model of Diffusion of Interstitial Oxygen in Silicon, Germanium and Silicon - Germanium Crystals.
Solid State Phenomena,
Vol. 108-109,
Issue. ,
p.
413.
Gusakov, Vasilii
2005.
Unified model of diffusion of interstitial oxygen in silicon and germanium crystals.
Journal of Physics: Condensed Matter,
Vol. 17,
Issue. 22,
p.
S2285.