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Characterization of Ferroelectric Thin Film PLZT(9/65/35) on R-Plane Sapphire

Published online by Cambridge University Press:  16 February 2011

S. Krishnakumar ,
S.C. Esener ,
C. Fan ,
V.H. Ozguz ,
M.A. Title ,
C. Cozzolino  and
S.H. Lee
S. Krishnakumar
Affiliation:
Department of Electrical and Computer Engineering, R-007, University of California, San Diego, La Jolla, CA 92037
S.C. Esener
Affiliation:
Department of Electrical and Computer Engineering, R-007, University of California, San Diego, La Jolla, CA 92037
C. Fan
Affiliation:
Department of Electrical and Computer Engineering, R-007, University of California, San Diego, La Jolla, CA 92037
V.H. Ozguz
Affiliation:
Department of Electrical and Computer Engineering, R-007, University of California, San Diego, La Jolla, CA 92037
M.A. Title
Affiliation:
Department of Electrical and Computer Engineering, R-007, University of California, San Diego, La Jolla, CA 92037
C. Cozzolino
Affiliation:
Department of Electrical and Computer Engineering, R-007, University of California, San Diego, La Jolla, CA 92037
S.H. Lee
Affiliation:
Department of Electrical and Computer Engineering, R-007, University of California, San Diego, La Jolla, CA 92037
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Abstract

The deposition of ferroelectric PLZT on r-plane sapphire using R-F Triode Magnetron Sputtering is reported. R-plane (1102) sapphire is chosen, in spite of its large lattice mismatch to PLZT, because of its capability of integrating MOS silicon circuits with PLZT modulators. Perovskite PLZT films with the desired composition (9/65/35) are obtained using co-deposition techniques around 500°C and post deposition annealing at 650°C. The deposited films exhibit good optical and electro-optical properties. The room temperature dielectric constant of the films was 1800 at 10 Khz. The refractive index of the films was in the range 2.2–2.5. The films showed a quadratic E-O effect with R=0.6×10−16 m2/V2. The films are promising for smart Spatial Light Modulators (SLM) applications.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 200: Symposium Y – Ferroelectric Thin Films I , 1990 , 91
Copyright
Copyright © Materials Research Society 1990

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References

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