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Characteristics of stable a-Si:H Schottoky cells fabricated by suppressing cluster deposition

Published online by Cambridge University Press:  11 July 2012

Masaharu Shiratani ,
Kosuke Hatozaki ,
Yuji Hashimoto ,
Yeonwon Kim ,
Hyunwoong Seo ,
Kunihiro Kamataki ,
Giichiro Uchida ,
Naho Itagaki  and
Kazunori Koga
Masaharu Shiratani
Affiliation:
Graduate School of Information Science and Electrical Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan
Kosuke Hatozaki
Affiliation:
Graduate School of Information Science and Electrical Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan
Yuji Hashimoto
Affiliation:
Graduate School of Information Science and Electrical Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan
Yeonwon Kim
Affiliation:
Graduate School of Information Science and Electrical Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan
Hyunwoong Seo
Affiliation:
Center of Plasma Nano-interface Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan
Kunihiro Kamataki
Affiliation:
Faculty of Arts and Science, Kyushu University, 744 Motooka, Fukuoka, 819-0395, Japan
Giichiro Uchida
Affiliation:
Graduate School of Information Science and Electrical Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan
Naho Itagaki
Affiliation:
Graduate School of Information Science and Electrical Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan
Kazunori Koga
Affiliation:
Graduate School of Information Science and Electrical Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan
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Abstract

We have developed a cluster-eliminating filter which reduces amount of amorphous silicon nanoparticles (clusters) incorporated into a-Si:H films. We have applied the filter to fabricate a-Si:H Schottky solar cells. The cells show a high initial fill factor FF=0.563 and a high stabilized value after light soaking FF=0.552 which light-induced degradation was quite low value of 1.95 %.

Keywords

amorphousphotovoltaicplasma-enhanced CVD (PECVD) (deposition)
Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1426: Symposium A – Amorphous and Polycrystalline Thin-Film Silicon Science and Technology—2012 , 2012 , pp. 377 - 382
Copyright
Copyright © Materials Research Society 2012

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References

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