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BaTiO3 Thin Films Prepared by Organometallic Chemical Vapor Deposition

Published online by Cambridge University Press:  25 February 2011

L.A. Wills ,
B.W. Wessels ,
D.L. Schulz  and
T.J. Marks
L.A. Wills
Affiliation:
Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208
B.W. Wessels
Affiliation:
Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208
D.L. Schulz
Affiliation:
Department of Chemistry, Northwestern University, Evanston, Illinois 60208
T.J. Marks
Affiliation:
Department of Chemistry, Northwestern University, Evanston, Illinois 60208
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Abstract

BaTiO3 thin films have been prepared by low pressure organometallic chemical vapor deposition on (100) MgO and (100) LaAlO3 substrates using the volatile precursors, titanium(IV) tetraisopropoxide and barium (hexafluoroacetylacetonate)2 (tetraglyme). The phase composition and structure of the films depends on the reactant partial pressure, growth temperature, and substrate. High quality, epitaxial BaTiO3 films can be prepared in-situ on LaAlO3 as confirmed by x-ray diffraction measurements. These BaTiO3 films exhibit smooth surface morphologies as evidenced by scanning electron microscopy. Electrical resistivity measurements indicate that the films are semi-insulating.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 243: Symposium G – Ferroelectric Thin Films II , 1991 , 217
Copyright
Copyright © Materials Research Society 1992

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