Hostname: page-component-745bb68f8f-d8cs5 Total loading time: 0 Render date: 2025-02-10T09:42:12.473Z Has data issue: false hasContentIssue false
  • English
  • Français

An Ultrafast Thin-Film Microcalorimeter with Monola Yer Sensitivity (J/m2)

Published online by Cambridge University Press:  21 February 2011

S.L. Lai ,
P. Infante ,
G. Ramanath  and
L.H. Allen
S.L. Lai
Affiliation:
Department of Materials Science and Engineering and Coordinated Science Laboratory, University of Illinois at Urbana-Champaign, Urbana, IL 61801
P. Infante
Affiliation:
National Nanofabrication Facility, Cornell University, Ithaca, NY 14853
G. Ramanath
Affiliation:
Department of Materials Science and Engineering and Coordinated Science Laboratory, University of Illinois at Urbana-Champaign, Urbana, IL 61801
L.H. Allen
Affiliation:
Department of Materials Science and Engineering and Coordinated Science Laboratory, University of Illinois at Urbana-Champaign, Urbana, IL 61801
Get access

Abstract

We introduce a high-sensitivity (∼1 J/m2) scanning microcalorimeter that can be used to perform direct calorimetric measurements on thin film samples at ultrafast heating rate (∼104 °C/s). This novel microcalorimeter is fabricated by utilizing SiN thin-film membrane technology, resulting in dramatically reduced thermal mass of the system. Calorimetric measurements are accomplished by applying a dc-current pulse to the thin-film metal (Ni) heater which also serves as a thermometer, and monitoring the real-time voltage and current of the heater. The temperature of the system and the energy delivered to the system are then determined. This calorimetric technique has been demonstrated by measuring the melting process of thin Sn films with thickness ranging from 13 to 1000 Å, and shows potential for calorimetric probing of irreversible reactions at interfaces and surfaces, as well as transformations in nanostructured materials.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 398: Symposium C – Thermodynamics and Kinetics of Phase Transformations , 1995 , 469
Copyright
Copyright © Materials Research Society 1998

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1 Tu, K.N., Mayer, J.W., and Feldman, L. C., in Electronic Thin Film Science for Electrical Engineers and Materials Scientists (Macmillan, New York, 1992).Google Scholar
2 Spaepen, F. and Thompson, C.V., Appl. Surf. Sci. 38, 1(1989).Google Scholar
3 Thiel, P.A., Behm, R.J., Norton, P.R., and Ertl, G., Surf. Sci. 121, L553(1982).Google Scholar
4 Stich, I., Payne, M.C., King-Smith, R.D., Lin, J. S., Phys. Rev. Lett. 68, 1351(1992).Google Scholar
5 Allen, L. H., Ramanath, G., Lai, S.L., and Ma, Z., Appl. Phys. Lett. 64, 417 (1994).Google Scholar
6 Lai, S.L., Ramanth, G., and Allen, L.H., Appl. Phys. Lett. 67, 1229(1995).Google Scholar
7 Borroni-Bird, C.E., and King, D.A., Rev. Sci. Instrum. 62, 2177(1991).Google Scholar
8 Denlinger, D.W., Abarra, E.N., Allen, K., Rooney, P.W., Messer, M.T., Watson, S.K., and Hellman, F., Rev. Sci. Instrum. 65, 2549(1994).Google Scholar
9 American Institute of Phvsics Handbook. 3rd ed. (McGraw-Hill, New York 1972).Google Scholar
10 Takagi, M., J. Phys. Soc. Jpn. 9, 359(1954); Ph. Buffat, and J.-P. Borel, Phys. Rev. A 13, 2287(1976).Google Scholar
11 Wronski, C.R.M., Br. J. Appl. Phys. 18, 1731(1967).Google Scholar