Crossref Citations
This article has been cited by the following publications. This list is generated based on data provided by Crossref.
Osborne, I.S.
Hajto, J.
Rose, M.J.
Snell, A.J.
Leœmber, P.G.
and
Owen, A.E.
1992.
The Role of the a-Si:H Layer in Metal / a-Si:H / Metal Memory Structures.
MRS Proceedings,
Vol. 258,
Issue. ,
Reeder, A A
Thomas, I P
Smith, C
Wittgreffe, J
Godfrey, D J
Hajto, J
Owen, A E
Snell, A J
Murray, A F
Rose, M J
Osborne, I S
and
LeComber, P G
1992.
Application of Analogue Amorphous Silicon Memory Devices to Resistive Synapses for Neural Networks.
MRS Proceedings,
Vol. 258,
Issue. ,
Rose, M.J.
Snell, A.J.
Lecomber, P.G.
Hajto, J.
Fitzgerald, A.G.
and
Owen, A.E.
1992.
Aspects of Non-Volatility in a-Si:H Memory Devices.
MRS Proceedings,
Vol. 258,
Issue. ,
Hajto, J.
Snell, A. J.
Hu, J.
Holmes, A. J.
Owen, A. E.
Rose, M. J.
and
Gibson, R. A. G.
1994.
Metal-semiconductor transition in electroformed chromium/amorphous silicon/vanadium thin-film structures.
Philosophical Magazine B,
Vol. 69,
Issue. 2,
p.
237.
Yun, Eui-Jung
Kim, Jwa-Yeon
and
Walser, R. M.
1997.
The analysis of one-dimensional conductance quantization in V|amorphous-V2O5|V thin film devices.
Applied Physics Letters,
Vol. 71,
Issue. 22,
p.
3263.
Hu, J.
Hajto, J.
Snell, A.J.
and
Rose, M.J.
2000.
AC characteristics of Cr/p/sup +/a-Si:H/V analog switching devices.
IEEE Transactions on Electron Devices,
Vol. 47,
Issue. 9,
p.
1751.