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Temperature Measurement at RTP Facilities-An Overview

Published online by Cambridge University Press:  10 February 2011

J. Wagner  and
F. G. Boebel
J. Wagner
Affiliation:
Fraunhofer Institute for Integrated Circuits, Erlangen, Germany
F. G. Boebel
Affiliation:
Siemens S.A. Usine IBM, Essones-Corbeil, FRANCE
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Abstract

Temperature is one of the most important quantities in semiconductor manufacturing. It plays a fundamental role in many standard production techniques and especially at RTP facilities. We will give an overview on standard temperature measurement techniques associated with RTP. Their basic principles, advantages and disadvantages will be discussed with respect to explicit applications.The potential physical and technical possibilities of optical temperature measurement are outlined as well as the problems like scattering, emissivity change and irradiation by halogen lamps. An overview on practical solutions of these problems is given together with explicit examples for applications including costs and benefits of their application.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 429: Symposium N – Rapid Thermal and Integrated Processing V , 1996 , 303
Copyright
Copyright © Materials Research Society 1996

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