Hostname: page-component-745bb68f8f-5r2nc Total loading time: 0 Render date: 2025-02-04T16:47:54.985Z Has data issue: false hasContentIssue false
  • English
  • Français

Superhard Nanocomposite of Nitride Superlattices by Opposed-Cathode Unbalanced Magnetron Sputtering

Published online by Cambridge University Press:  25 February 2011

X. Chu ,
M. S. Wong ,
W. D. Sproul  and
S. A. Barnett
X. Chu
Affiliation:
Department of Materials Science and Engineering, Northwestern University, 2145 Sheridan Rd., Evanston, IL 60208
M. S. Wong
Affiliation:
BIRL, Northwestern University, 1801 Maple Ave., Evanston, IL 60201
W. D. Sproul
Affiliation:
BIRL, Northwestern University, 1801 Maple Ave., Evanston, IL 60201
S. A. Barnett
Affiliation:
Department of Materials Science and Engineering, Northwestern University, 2145 Sheridan Rd., Evanston, IL 60208
Get access

Abstract

Nanocomposite films of polycrystalline nitride superlattices with nanometer grain size were deposited onto tool steel substrates by a one-step process using an opposed-cathode high-rate reactive unbalanced magnetron sputtering system. The superlattices are composed of alternating thin layers of different nitrides such as TiN/NbN and TiN/VN. The thicknesses of two neighboring layers were between 3 and 150 nm and were determined by the rotating speed of the substrate holder and the sputtering rate of the individual layer material. The films exhibited exceptional hardness as high as 5200 kgf/mm2 for TiN/NbN superlattice and 5 100 kgf/mm2 for TiN/VN superlattice. The hardnesses of the superlattice coatings were strongly dependent on several deposition parameters such as the superlattice period, the nitrogen partial pressure, and the substrate bias voltage. One of the possible mechanisms for the hardness enhancement is the effect of nanophase materials, which were created mainly by the influence of the artificially layered-structure and the low energy ion bombardment during film growth.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 286: Symposium J – Nanophase and Nanocomposite Materials , 1992 , 379
Copyright
Copyright © Materials Research Society 1993

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Helmesson, U., Todorova, S., Barnett, S. A., Sundgren, J.-E., Markert, L. C., and Greene, J.E., J. Appl. Phys., 62, 481 (1987).Google Scholar
2 Mirkarimi, P.B., Hultman, L., and Barnett, S.A., Appl. Phys. Lett., 57 (25), 2654 (1990).Google Scholar
3. Shinn, M., Hultman, L., and Barnett, S. A., J. of Materials Res., 7, 901 (1992).Google Scholar
4. Mirkarimi, P. B., Shinn, M., Barnett, S. A., J. Vac. Sci. Technol., A 10 (1), 75 (1992).Google Scholar
5. Barnett, S. A., in Physics of Thin Films, edited by Vossen, J. L. and Franccmbe, M., in press.Google Scholar
6. Chu, X., Wong, M. S., Sproul, W. D., Rohde, S. L. and Barnett, S. A., J. Vac. Sci. Technol., A 10 (4), 1604 (1992).Google Scholar
7. Chu, X., Wong, M.S., Sproul, W.D., and Barnett, S.A., accepted to be published in Surface and Coating Tech., March 1993.Google Scholar
8. Sproul, W. D., Rudnik, P. J., Graham, M. E., and Rohde, S. L., Surface and Coating Technology, 43/44, 270 (1990).Google Scholar
9. Sproul, W. D., Rudnik, P. J., and Gogol, C. A., Thin Solid Films, 171, 171 (1989).Google Scholar
10. Sproul, W. D., Rudnik, P. J., and Graham, M. E., Surface and Coatings Technology, 39/40, 355 (1989).Google Scholar
11. Wong, M.S., Sproul, W.D., Chu, X., and Barnett, S.A., “Reactive Magnetron Sputter Deposition of Niobium Nitride Films”, submitted to J. Vac. Sci. Technol. 1993.Google Scholar
12. Farges, G., Beauprez, E. and Degout, D., Surface and Coatings Technology, 44/45, 115 (1992).Google Scholar
13. Springer, R.W., Ott, N. L. and Catlett, D. S., J. Vac. Sci. Technol., A 4 (16), 878 (1979).Google Scholar
14. Shih, K.K. and Dove, D.B., Appl. Phys. Lett. 61 (6), 654 (1992).Google Scholar
15. Brus, L.E., Siegel, R.W. et al. , Panel Report on Research opportunities on clusters and cluster-assembled materials, J. Mater. Res., 4 (3), 704 (1989).Google Scholar
16. Siegel, R.W., Annu. Rev. Mater. Sci., 21, 559 (1991).Google Scholar