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A Study of the Diffusion of Phosphorus in Ni/amorphous NiPx and a-NiPx/a-NiPy. Multilayers

Published online by Cambridge University Press:  26 February 2011

C. A. Ross ,
L. M. Goldman ,
J. A. Barnard  and
F. Spaepen
C. A. Ross
Affiliation:
Division of Applied Sciences, Harvard University, Cambridge, MA 02138
L. M. Goldman
Affiliation:
Division of Applied Sciences, Harvard University, Cambridge, MA 02138
J. A. Barnard
Affiliation:
Dept. of Metallurgical and Materials Engineering, University of Alabama, Tuscaloosa, AL 35487
F. Spaepen
Affiliation:
Division of Applied Sciences, Harvard University, Cambridge, MA 02138
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Abstract

An x-ray technique has been used to measure the diffusion of phosphorus in crystalline Ni/amorphous NiPx and amorphous NiPx/NiPy multilayer thin films produced by electrodeposition. The films have repeat lengths in the range 30–80Å and P contents x, y < 25at.%. A value for the interdiffusivity in amorphous NiPx is derived from measurements on fully amorphous films. The behaviour of partially crystalline films is described in terms of phosphorus diffusion into the nickel grain boundaries.

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Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 205: Symposium F – Kinetics of Phase Transformations , 1990 , 239
Copyright
Copyright © Materials Research Society 1992

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