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Non-Stoichiometric Transfer of Complex Oxides by Pulsed Laser Deposition at Low Fluences

Published online by Cambridge University Press:  15 February 2011

B. Dam ,
J.H. Rector ,
J. Johansson ,
DG. DE Groot  and
R. Griessen
B. Dam
Affiliation:
Faculty of Physics and Astronomy, Free University, De Boelelaan 1081, NL-1081 HV Amsterdam, The Netherlands
J.H. Rector
Affiliation:
Faculty of Physics and Astronomy, Free University, De Boelelaan 1081, NL-1081 HV Amsterdam, The Netherlands
J. Johansson
Affiliation:
Faculty of Physics and Astronomy, Free University, De Boelelaan 1081, NL-1081 HV Amsterdam, The Netherlands
DG. DE Groot
Affiliation:
Faculty of Physics and Astronomy, Free University, De Boelelaan 1081, NL-1081 HV Amsterdam, The Netherlands
R. Griessen
Affiliation:
Faculty of Physics and Astronomy, Free University, De Boelelaan 1081, NL-1081 HV Amsterdam, The Netherlands
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Abstract

We provide evidence that non-stoichiometric ablation of YBa2Cu3O7δ at low fluences is due to a phase separation of the target surface. On the other hand, in SrTiO3 we find at low fluences evidence for preferential ablation which is assisted by volume-diffusion. As a result, the Sr/Ti ratio of the ablated films can be tuned by choosing the appropriate fluence.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 397: Symposium B – Advanced laser Processing of Materials-Fundamentals and Applications , 1995 , 175
Copyright
Copyright © Materials Research Society 1996

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References

REFERENCES

1 Teves, H., Vakuum in der Praxis 1 (1990) 23; G. Betz and G.K. Wehner in: Sputtering by Particle Bombardment, Vol.II. Ed. R. Behrisch, Springer-Verlag (1983) p11-90.Google Scholar
2 Sobol, E.N. and Petrovskaya, N.G., Supercond. Sci. Technol. 6 (1993) 67 Google Scholar
3 Dam, B., Rector, J., Chang, M.F., Kars, S., de Groot, D.G., and Griessen, R., Appl.Phys Lett. 65 (1994) 1581 Google Scholar
4 Dam, B., Rector, J., Chang, M.F., Kars, S., de Groot, D.G., and Griessen, R., Appl Surf. Sci. 86 (1995) 13 Google Scholar
5 Murakami, M., Morita, M., Doi, K., Miyamoto, K., Hamada, H., Jpn. J. Appl. Phys. 28 (1989) L399 Google Scholar
6 Coceo, A. and Massazza, F., Ann. Chim. (Rome) 53 (1963) 892 Google Scholar
7 Proyer, S., Stangl, E., Borz, M., and Bäuerle, D., Appl. Surf. Sci. to be publishedGoogle Scholar
8 Foltyn, S.R. in: Pulsed Laser Deposition of Thin Films. Eds. Chrisey, D.B. and Hubler, G.K., Wiley Interscience, 1994 Google Scholar
9 Dam, B., Rector, J.H., Johansson, J., Kars, S., Griessen, R., Appl. Surf. Sci., to be publishedGoogle Scholar
10 Scheel, H., Z. fuer Kristallographie 143 (1976) 417 Google Scholar
11 Kelly, and Rothenberg, J.E., Nucl. Instr. and Meth. B7/8 (1985) 755 Google Scholar