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Metal Deposition with Incoherent Excimer Radiation

Published online by Cambridge University Press:  21 February 2011

Hilmar Esrom  and
Ulrich Kogelschatz
Hilmar Esrom
Affiliation:
Asea Brown Boveri AG, Corporate Research Heidelberg, D-6900 Heidelberg, FRG
Ulrich Kogelschatz
Affiliation:
Corporate Research Baden, CH-5405 Baden, Switzerland
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Abstract

VUV light-induced decomposition of palladium acetate films was performed by using a new incoherent excimer source. With pure xenon this excimer source emits radiation peaking at a wavelength of 172 nm. We investigated mainly the palladium deposition from spin-on palladium acetate films on aluminum oxide substrates. By using EMP we determined the palladium thickness as a function of UV intensity and exposure time. A remarkable temperature effect of the photolytic deposition process was observed also in a temperature range in which no thermal decomposition is possible. The exposure of spin-on palladium acetate films on ceramic substrates was also accomplished through metal contact masks. Patterned palladium films were reinforced by electroless copper and nickel plating processes [1]. The obtained structures had the same high edge quality as those produced by using excimer lasers [2].

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 158: Symposium B – In-Situ Patterning: Selective Area Deposition and Etching , 1989 , 189
Copyright
Copyright © Materials Research Society 1990

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References

REFERENCES

1. Esrom, H., Wahl, G., and Kogelschatz, U., Journal De Physique, Colloque C5,719(1989)Google Scholar
2. Esrom, H., Wahl, G., and Stuke, M., Mat. Res.Soc. Symp. Proc. Vol. 131,581 (1989)Google Scholar
3. Boyd, I.W., J.Phys.D:Appl.Phys. 21,S23(1988)Google Scholar
4. Sausa, R.C., Gupta, A., and White, J.R., J.Electrochem.Soc., Vol, 134, No. 11,2707(1987)Google Scholar
5. Cole, H.S., Liu, Y.S., Rose, J.W., Guida, R., Levinson, L.M. and Philipp, H.R., in Laser Processes For Microelectronic Applications. Vol.88-10, of the Proceedings of the Electrochemical Society, edited by Ritsko, J.J., Ehrlich, D.J., and Kashiwagi, M. (Pennington, NJ, 1988)Google Scholar
6. Gottsleben, O. and Stuke, M., Appl.Phys.Lett. 52(26), 2230(1988)Google Scholar
7. Thomas, R.R. and Park, J.M., J.Electrochem.Soc.,Vol.136, No.6,1661(1989)Google Scholar
8. Fisanick, G.J., Gross, M.E., Hopkins, J.B., Fennell, M.D., Schnoes, K.J., and Katzir, A., J.Appl.Phys. 57(4),1139(1985)Google Scholar
9. Fisanick, G.J., Hopkins, J.B., Gross, M.E., Fennell, M.D., and Schnoes, K.J., Appl.Phys.Lett. 46(112), 1184(1985)Google Scholar
10. Gross, M.E., Fisanick, G.J., Gallagher, P.K., Schnoes, K.J., and Fennell, M.D., Appl.Phys.Lett. 47(9),923(1985)Google Scholar
11. Auerbach, A., Appl.Phys.Lett. 47(7),669(1985)Google Scholar
12. Gross, M.E., Appelbaum, A., and Schnoes, K.J., J.Appl.Phys. 60(2),529(1986)Google Scholar
13. Gross, M.E., Appelbaum, A., and Gallagher, P.K., J.Appl.Phys. 61(4),1628(1987)Google Scholar
14. Gupta, A. and Jagannathan, R., Appl.Phys.Lett. 51(26), 2254(1987)Google Scholar
15. Sharp, D.J., Abs. 262, p. 651, Electrochem.Soc.Extended Abstracts, Spring Meeting, New York, May4-9,1969 Google Scholar
16. Sharp, D.J., Henrickson, J.F., D'Amico, J.F., and Kenney, J.T., Abs.136, p. 367, Electrochem.Soc.Fall Meeting, Detroit, Mich., Oct.5-9, 1969 Google Scholar
17. Sharp, D.J., Henrickson, J.F., D'Amico, J.F., and Kenney, J.T., 23rd Annual Conference, Photographic Science and Engineering, New York, N.Y., May 1970 Google Scholar
18. Sharp, D.J., Plating, 58,786(1971)Google Scholar
19. D'Amico, J.F., Angelo, M.A. De, Henrickson, J.F., Kenney, J.T., and Sharp, D.J., J.Electrochem.Soc., Vol. 118, No. 10,1695(1971)Google Scholar
20. Eliasson, B., Kogelschatz, U., and Stein, H.J., Europ. Photochem.Ass. Newsletter, No.32,29(1988)Google Scholar
21. Eliasson, B. and Kogelschatz, U., Appl.Phys.B. 46,299(1988)Google Scholar
22. Eliasson, B. and Kogelschatz, U., Proc. IX Int. Conf. on Gas Discharges and their Applications, Venice 1988, pp.709 Google Scholar
23. Eliasson, B. and Kogelschatz, U., Proc. Wasser Berlin 1989, Ozone + UV in the treatment of water and other liquids, Berlin 1989, Masschelein, W.J., ed., pp.IV–6 Google Scholar
24. Ye, Y. and Hunsperger, R.G., Appl.Phys.Lett., Vol.51, No.25, 2136(1987)Google Scholar
25. Esrom, H., Wahl, G., and Stuke, M., to be published in Chemtronics (1989)4 Google Scholar
26. Wahl, G. and Weber, R., private communication (1989)Google Scholar