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Ion Beam Sputter Deposition Of Ferroelectric Oxide Thin Films

Published online by Cambridge University Press:  16 February 2011

Thomas M. Graettinger ,
O. Auciello ,
M. S. Ameen ,
H. N. Al-Shareef ,
K. Gifford  and
A. I. Kingon
Thomas M. Graettinger
Affiliation:
North Carolina State University, Raleigh, NC 27695-7919.
O. Auciello
Affiliation:
North Carolina State University, Raleigh, NC 27695-7919. Microelectronics Center of North Carolina, Research Triangle Park, NC 27709-2889.
M. S. Ameen
Affiliation:
North Carolina State University, Raleigh, NC 27695-7919. Present Address: Materials Research Corporation, Orangeburg, NY 10962.
H. N. Al-Shareef
Affiliation:
North Carolina State University, Raleigh, NC 27695-7919.
K. Gifford
Affiliation:
North Carolina State University, Raleigh, NC 27695-7919.
A. I. Kingon
Affiliation:
North Carolina State University, Raleigh, NC 27695-7919.
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Abstract

Ferroelectric oxide films have been studied for their potential application as integrated optical materials and nonvolatile memories. Electro-optic properties of potassium niobate (KNbO3) thin films have been measured and the results correlated to the microstructures observed. The growth parameters necessary to obtain single phase perovskite lead zirconate titanate (PZT) thin films are discussed. Hysteresis and fatigue measurements of the PZT films were performed to determine their characteristics for potential memory devices.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 223: Symposium E – Low Energy Ion Beam and Plasma Modification of Materials , 1991 , 273
Copyright
Copyright © Materials Research Society 1991

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References

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