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Influence of Substrate Temperature on Tin Oxide Thin Films Deposited by Electron Beam Evaporation Technique

Published online by Cambridge University Press:  25 February 2011

S. M. Rozati ,
S. Mirzapour ,
M. G. Takwale ,
B. R. Marathe  and
V. G. Bhide
S. M. Rozati
Affiliation:
School of Energy Studies, Department of Physics, University of Poona, Pune 411 007, India.
S. Mirzapour
Affiliation:
School of Energy Studies, Department of Physics, University of Poona, Pune 411 007, India.
M. G. Takwale
Affiliation:
School of Energy Studies, Department of Physics, University of Poona, Pune 411 007, India.
B. R. Marathe
Affiliation:
School of Energy Studies, Department of Physics, University of Poona, Pune 411 007, India.
V. G. Bhide
Affiliation:
School of Energy Studies, Department of Physics, University of Poona, Pune 411 007, India.
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Abstract

Transparent conducting tin oxide films were prepared by an electron beam evaporation technique. As-deposited films were amorphous or polycrystalline depending on the substrate temperature and the time of deposition. In order to get transparent and conducting thin films of SnO2, as-deposited films were subjected to further heat-treatment in air at 650°C for 2 hours. Physical properties of as-deposited and annealed films are discussed with reference to substrate temperature and deposition time.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 242: Symposium G – Wide Band-Gap Semiconductors , 1992 , 755
Copyright
Copyright © Materials Research Society 1992

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References

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