Hostname: page-component-745bb68f8f-lrblm Total loading time: 0 Render date: 2025-02-05T15:14:30.081Z Has data issue: false hasContentIssue false
  • English
  • Français

Growth Characteristics of Co-Cr Thin Films for Magnetic Recording

Published online by Cambridge University Press:  21 February 2011

B. G. Demczyk  and
D. E. Laughlin
B. G. Demczyk
Affiliation:
Department of Metallurgical Engineering and Materials Science,Camegie-Mellon University Pittsburgh, PA 15213
D. E. Laughlin
Affiliation:
Department of Metallurgical Engineering and Materials Science,Camegie-Mellon University Pittsburgh, PA 15213
Get access

Abstract

The growth characteristics of magnetron sputtered Co-22%Cr thin films on amorphous glass or carbon substrates have been investigated utilizing transmission electron microscopy,. X-ray diffraction, electrical resisivity and in-plane stress measurements. Results indicate that the initial deposit is “amorphous”, but that isolated islands of small crystallites form before the film reaches 5nm film thickness. By 10nm, well oriented grains with hcp c axis perpendicular to the film plane develop, and by 50nm, a twinned columnar microstructure is evident. As this occurs, the in-plane film stress becomes constant. Also, we have observed a distinct subgrain structure in the thinner films (10–50 nm), and this is reflected in the electrical resistivity. This cannot be accounted for by an “evolutionary selection” growth scenario, but must be related to the low surface mobility of adatoms at these low substrate deposition temperatures.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 119: Symposium F – Adhesions in Solids , 1988 , 159
Copyright
Copyright © Materials Research Society 1988

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1) Iwasaki, S. and Nakamura, Y., IEEE Trans. Mag. MAG–13 (5), 1272 1977.Google Scholar
2) Weilinga, T., PhD Dissertation, Twente Univ. of Tech., Enschede, The Netherlands 1983.Google Scholar
3) Hergt, R., Pfeiffer, H. and Fritzch, L., Phys. Stat. Sol. (a) 98, 69 1986.CrossRefGoogle Scholar
4) Grundy, P.J., Ali, M. and Faunce, C. A., IEEE Trans Mag., MAG–25 (5), 794 1984.CrossRefGoogle Scholar
5) Futamoto, M., Honda, Y., Kakibayashi, H., Shimotsu, T. and Yoshida, K., Jap. Jl. Appl. Phys. 24 (6), L460 1985.Google Scholar
6) Hwang, C., Laughlin, D.E., Mitchell, P.V., Layadi, A., Mountfield, K.R., Snyder, J. and Artman, J.O., J. Magn. Mag. Mat., 54–57 ,1676 1986.Google Scholar
7) Lee, J. W., Demczyk, B.G., Mountfield, K.R., and Laughlin, D.E., J. Appl. Phys., 61 (8), 3813 1987.Google Scholar
8) Lee, J.W., Demczyk, B.G., Mountfield, K.R.and Laughlin, D.E., IEEE Trans. Mag., MAG–23 (5), 2455 1987.CrossRefGoogle Scholar
9) Young, D.W., Ho, H., Bauer, C.L., Mahajan, S. and Milnes, A.G., Proc. 1988 MRS Spring Mtg.Google Scholar
10) Edington, J.W., Practical Electron Microscopy in Materials Science, Van Nostrand Reinhold Co., N.Y. 1976, p 83.Google Scholar
11) Sondheimer, E.H., Adv. Phys.,1 ,1 1952.CrossRefGoogle Scholar
12) Klockholm, E. and Berry, B.S., J. Electrochem. Soc., 824 1968.Google Scholar
13) Hoffman, R.W., in Physics of Thin Films, Hass, G., ed., Academic Press, N.Y., 3, 211 1966.Google Scholar
14) Byun, L., Silverstein, J.M., and Judy, J.H., unpublished research.Google Scholar
15) Van der Drift, A., Philips Res. Rpts.,22, 267 1967.Google Scholar
16) Grovenor, C.R.M.,Hentzell, H.T.G. and Smith, D.A., Acta. Met., 32 (5), 773 1984.Google Scholar