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Formation of thin film YBaCuO Superconductors from Cu/BaO/Y2O3 Layer Structures

Published online by Cambridge University Press:  28 February 2011

Chin-An Chang ,
C. C. Tsuei ,
C. C. Chi ,
M. R. Scheuermann ,
D. S. Yee  and
J. P. Berosh
Chin-An Chang
Affiliation:
IBM T. J. Watson Research Center, Yorktown Heights N. Y. 10598
C. C. Tsuei
Affiliation:
IBM T. J. Watson Research Center, Yorktown Heights N. Y. 10598
C. C. Chi
Affiliation:
IBM T. J. Watson Research Center, Yorktown Heights N. Y. 10598
M. R. Scheuermann
Affiliation:
IBM T. J. Watson Research Center, Yorktown Heights N. Y. 10598
D. S. Yee
Affiliation:
IBM T. J. Watson Research Center, Yorktown Heights N. Y. 10598
J. P. Berosh
Affiliation:
IBM T. J. Watson Research Center, Yorktown Heights N. Y. 10598
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Abstract

Thin film superconductors of the YBaCuO family have been fabricated using layer structures of Cu/BaO/Y2O3 deposited by electron-beam evaporation. Using layer thicknesses off the stoichiometric YBa2Cu3O7, we have formed superconducting films with zero resistance above 77°K using MgO and SrTiO3 substrates. The films were found to be composed of both the superconducting YBa2Cu3O7 phase, and the non-superconducting green Y2BaCuO7 phase. Dependence of transition temperatures on the annealing temperatures and the substrates has also been studied.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 99: Symposium AA – High-Temperature Superconductors , 1987 , 315
Copyright
Copyright © Materials Research Society 1988

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References

REFERENCES

1. Wu, M. K., Asgburn, J. R., Torng, C. J., Hor, P. H., Ment, R. L, Gao, L., Huang, A. J., Wang, Y. Q., and Chu, C. W., Phys. Rev. Lett. 58, 908 (1987).Google Scholar
2. Hor, P. H., Goa, L., Meng, R. L., Huang, Z. J., Wang, Y. Q., Forster, K., Vassilious, J., Chu, C. W., Wu, M. K., Ashburn, J. R., and Torng, C. J., Phys. Rev. Lett. 58, 911 (1987).Google Scholar
3. Beyers, R., Lim, G., Engler, E. M., Savoy, R. J., Shaw, T. M., Dinger, T. R., Gallagher, W. J., and Sandstrom, R. L., Appl. Phys. Lett. 50, 1918 (1987).Google Scholar
4. Cava, R. J., van Dover, R. B., Batlogg, B., and Reitman, E. A., Phys. Rev. Lett. 58, 408 (1987).Google Scholar
5. Laibowitz, R. B., Koch, R. H., Chaudari, P., and Gambino, R. J., Phys. Rev. B 35, 8821 (1987).Google Scholar
6. Bao, Z. L., Wang, F. R., Jiang, Q. D., Wang, S. Z., Ye, Z. Y., Wu, K., Li, C. Y., and Yin, D. L., Appl. Phys. Lett. 51, 946 (1987).Google Scholar
7. Gurvitch, M. and Fiory, A. T., Appl. Phys. Lett. 51, 1027 (1987).Google Scholar
8. Kaiser, D. L., Holtzbery, F., Scott, B. A., and McGuire, T. R., Appl. Phys. Lett. 51, 1040 (1987).Google Scholar
9. Handbook of Chemistry and Physics, 65th edition, CRC Press, Boca Raton, Fl. (1984).Google Scholar