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Emissivity Independent Process Control in a Short Wavelength ARC Lamp RTP Chamber

Published online by Cambridge University Press:  10 February 2011

Marcel E. Lefrançois ,
David M. Camm  and
Brendon J. Hickson
Marcel E. Lefrançois
Affiliation:
Vortek Industries Ltd., 1820 Pandora St., Vancouver, BC, Canada, V5L 1 M5, mailbox@vortek.com
David M. Camm
Affiliation:
Vortek Industries Ltd., 1820 Pandora St., Vancouver, BC, Canada, V5L 1 M5, mailbox@vortek.com
Brendon J. Hickson
Affiliation:
Vortek Industries Ltd., 1820 Pandora St., Vancouver, BC, Canada, V5L 1 M5, mailbox@vortek.com
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Abstract

Two dimensional temperature measurements of patterned wafers are presented. The measurements are made using a commercially available CCD camera operating at λ=900nm, yielding a spatial resolution of 1 pixel per mm2 and a relative accuracy of ±0.25 °C. The emissivity is determined using a reflectivity measurement made possible by the unique properties of a short wavelength arc lamp RTP chamber. The use of this measurement system for closed loop control is discussed and the application to maintaining accurate time temperature profiles independent of emissivity is described.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 429: Symposium N – Rapid Thermal and Integrated Processing V , 1996 , 321
Copyright
Copyright © Materials Research Society 1996

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References

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