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Dust Particle Diagnostics in Rf Plasma Deposition of Silicon and Silicon Oxide Films (Invited)

Published online by Cambridge University Press:  10 February 2011

Ch. Hollenstein ,
A. A. Howling ,
C. Courteille ,
J.-L. Dorier ,
L. Sansonnens ,
D. Magni  and
H. Müller
Ch. Hollenstein
Affiliation:
Centre de Recherches en Physique des Plasmas, Ecole Polytechnique Fédérale de Lausanne, PPB - Ecublens, CH-1015 Lausanne, Switzerland
A. A. Howling
Affiliation:
Centre de Recherches en Physique des Plasmas, Ecole Polytechnique Fédérale de Lausanne, PPB - Ecublens, CH-1015 Lausanne, Switzerland
C. Courteille
Affiliation:
Centre de Recherches en Physique des Plasmas, Ecole Polytechnique Fédérale de Lausanne, PPB - Ecublens, CH-1015 Lausanne, Switzerland
J.-L. Dorier
Affiliation:
Centre de Recherches en Physique des Plasmas, Ecole Polytechnique Fédérale de Lausanne, PPB - Ecublens, CH-1015 Lausanne, Switzerland
L. Sansonnens
Affiliation:
Centre de Recherches en Physique des Plasmas, Ecole Polytechnique Fédérale de Lausanne, PPB - Ecublens, CH-1015 Lausanne, Switzerland
D. Magni
Affiliation:
Centre de Recherches en Physique des Plasmas, Ecole Polytechnique Fédérale de Lausanne, PPB - Ecublens, CH-1015 Lausanne, Switzerland
H. Müller
Affiliation:
Centre de Recherches en Physique des Plasmas, Ecole Polytechnique Fédérale de Lausanne, PPB - Ecublens, CH-1015 Lausanne, Switzerland
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Abstract

Particle contamination formed in reactive plasmas imposes an upper limit on the rate for particle-free deposition. Conversely, these plasmas could be exploited to produce nanometric clusters and particles for various applications. Infrared absorption spectroscopy has been applied to analyse the chemical composition of suspended particles. Mass spectrometry was also used to investigate cluster formation in these deposition plasmas. In pure silane plasmas, a random model reproduces the measured mass spectra, whereas the rich plasma chemistry in silane/oxygen mixtures shows a remarkable tendency to produce silasesquioxane anions.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 507: Symposium A – Amorphous & Microcrystalline Silicon Technology 1998 , 1998 , 547
Copyright
Copyright © Materials Research Society 1998

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References

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