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Dependence of Mo/Si Multilayer Morphology on Deposition Angle

Published online by Cambridge University Press:  28 February 2011

Yuanda Cheng ,
Mary Beth Stearns  and
David J. Smith
Yuanda Cheng
Affiliation:
Department of Physics. Arizona State University. Tempe, AZ 85287
Mary Beth Stearns
Affiliation:
Department of Physics. Arizona State University. Tempe, AZ 85287
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Abstract

Studies have been made of the dependence of the structure on the deposition angle and the substrate temperature of a series of Mo/Si multilyers fabricated in a UHV system by e-beam evaporation. The detailed morphology was determined by cross-sectional high resolution electron microscopy. Columnar growth in the crystalline Mo layers was found to follow the tangent rule. The overall quality of the multilayers was found to depend strongly on the growth conditions.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 160 , 1989 , 583
Copyright
Copyright © Materials Research Society 1990

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References

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