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Cowparison Studies of Hydrogenated Amorphous Silicon Films Prepared From Silane-Hydrogen and Silmne-Helium Mixtures

Published online by Cambridge University Press:  28 February 2011

R. I. Patel ,
D. J. Olsen ,
J. R. Shirck  and
N. T. Tran
R. I. Patel
Affiliation:
Electronic and Information Sector Laboratories, 3M Company, St. Paul, MN
D. J. Olsen
Affiliation:
Electronic and Information Sector Laboratories, 3M Company, St. Paul, MN
J. R. Shirck
Affiliation:
Electronic and Information Sector Laboratories, 3M Company, St. Paul, MN
N. T. Tran
Affiliation:
Electronic and Information Sector Laboratories, 3M Company, St. Paul, MN
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Abstract

Hydrogenated amorphous silicon films were produced from silane/hydrogen and silane/helium gas mixtures by RF glow discharge. We examined the optical and electrical properties of films produced with these gas mixtures, at various RF power levels and silane fractions. Film quality was analyzed by measuring the dark and photoconductivity, optical band gap, and activation energy. Optical emission spectroscopy was also used as a diagnostic tool for studying the plasma during glow discharge depositions. Experimental results indicate that amorphous silicon films made from silane/helium mixtures exhibit improved optoelectronic properties, higher deposition rates, and higher emission intensity ratios (ISiH/IH) as compared to films produced from silane/hydrogen mixtures. In preparing films from silane/helium mixtures, the onset of dust/powder formation occurs at considerably higher RF powers as compared to silane/hydrogen, thus making this approach an attractive commercial option for depositing films at high rates.

Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 70: Symposium E – Materials Issues in Amorphous-Semiconductor Technology , 1986 , 55
Copyright
Copyright © Materials Research Society 1986

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References

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