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A Comparative Study of Nucleation Enhancement Techniques for Plasma Cvd of Diamond Thin Films

Published online by Cambridge University Press:  22 February 2011

R.J. Meilunas  and
A. Tobin
R.J. Meilunas
Affiliation:
Grumman Aerospace Bethpage N.Y
A. Tobin
Affiliation:
Grumman Aerospace Bethpage N.Y
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Abstract

Three methods recently proposed for enhancing the nucleation density of thin film diamond on non-diamond surfaces during microwave plasma assisted chemical vapor deposition are investigated. The results of a series of nucleation and growth studies utilizing a dc biasing technique, carbon cluster (C70) thin film overlayers, and thin film metal (Fe) overlayers for diamond nucleation enhancement are presented. The influence of the substrate and plasma processing parameters under which the above nucleation enhancement effects occur has been determined for the three respective techniques.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 349: Symposium T – Novel Forms of Carbon II , 1994 , 409
Copyright
Copyright © Materials Research Society 1994

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References

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