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Bromine-Methanol Etching of Cadmium Telluride in a Rotating Disk Reactor

Published online by Cambridge University Press:  25 February 2011

Michael B. Gentzler ,
Edmond I. Ko ,
Paul J. Sides  and
Paul T. Bowman
Michael B. Gentzler
Affiliation:
Department of Chemical Engineering, Carnegie Mellon University, Pittsburgh, PA 15213
Edmond I. Ko
Affiliation:
Department of Chemical Engineering, Carnegie Mellon University, Pittsburgh, PA 15213
Paul J. Sides
Affiliation:
Department of Chemical Engineering, Carnegie Mellon University, Pittsburgh, PA 15213
Paul T. Bowman
Affiliation:
Olin Chemicals, New Haven, CT 06511
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Abstract

The kinetics of the bromine-methanol etching of CdTe were studied in a rotating disk reactor as a function of temperature, bromine concentration, substrate orientation, and rotation rate. The results indicated that the etching process is mass transfer controlled from -20°C to 40°C and to a maximum rotation rate of 1200 RPM. A one-dimensional transport model was used to obtain effective diffusion coefficients for bromine in methanol. The diffusion coefficient of the etchant in methanol is given by 3.7×10-8 (T/η) cm2/s over the range of 2.5°C to 23°C.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 204: Symposium E – Chemical Perspectives of Microelectronic Materials II , 1990 , 237
Copyright
Copyright © Materials Research Society 1991

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References

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