Published online by Cambridge University Press: 17 March 2011
A description of the transient diffusion and activation of boron during post-implantation an- nealing steps is one of the most challenging tasks. In industrially relevant situation, it needs to address diffusion at extrinsic concentrations, the agglomeration of self-interstitials, and the formation of boron-interstitial clusters. This article describes the experimental work performed or used to calibrate model parameters as independently as possible. In particular, the experiments used to extract information about the energetics of boron-interstitial clusters are described.