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Adsorbed Tma on Dielectric Oxide Surfaces

Published online by Cambridge University Press:  26 February 2011

A. C. Engelsberg ,
J. J. Chera  and
G. M. Korenowski
A. C. Engelsberg
Affiliation:
Department of Chemistry» Rensselaer Polytechnic Institute Troy, NY 12180-3590
J. J. Chera
Affiliation:
Department of Chemistry» Rensselaer Polytechnic Institute Troy, NY 12180-3590
G. M. Korenowski
Affiliation:
Department of Chemistry» Rensselaer Polytechnic Institute Troy, NY 12180-3590
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Abstract

Trimethyl aluminum vapor is found to chemisorb on the surface of silicon dioxide and aluminum oxide via reaction with surface hydroxyl groupe. In addition to the chemisorbed layer, trimethyl aluminum also forms a weakly bound multilayer consisting of molecular dimers.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 101: Symposium B – Laser and Particle-Beam Chemical Processing for Microelectronics , 1987 , 159
Copyright
Copyright © Materials Research Society 1998

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References

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