Hostname: page-component-7dd5485656-gs9qr Total loading time: 0 Render date: 2025-10-30T13:35:40.320Z Has data issue: false hasContentIssue false
  • English
  • Français

Plasmonic isolator for photonic integrated circuits

Published online by Cambridge University Press:  11 June 2018

Hiromasa Shimizu  and
Vadym Zayets
Hiromasa Shimizu
Affiliation:
Department of Electrical and Electronic Engineering, Tokyo University of Agriculture and Technology, Japan; h-shmz@cc.tuat.ac.jp
Vadym Zayets
Affiliation:
Spintronics Research Center, National Institute of Advanced Industrial Science and Technology (AIST), Japan; v.zayets@aist.go.jp
Get access

Abstract

This article discusses recent studies of on-chip integration of a plasmonic isolator on a Si substrate and a hybrid isolator on an InP substrate. The key characteristics of the plasmonic isolator are reviewed and future prospects are discussed. A method to enhance the magneto-optical figure of merit (FOM) and reduce the propagation loss of a surface plasmon in order to realize the proposed design of the plasmonic isolator is described. One hundred percent enhancement of the FOM and 20× reduction of propagation loss in the optimized ferromagnetic plasmonic structure are experimentally demonstrated.

Keywords

ferromagneticmagneto-opticoptical propertiesoptoelectronic

Information

Type
Materials for Nonreciprocal Photonics
Information
MRS Bulletin , Volume 43 , Issue 6: Materials for Nonreciprocal Photonics , June 2018 , pp. 425 - 429
Copyright
Copyright © Materials Research Society 2018 

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

Article purchase

Temporarily unavailable

References

Stadler, B.J.H., Mizumoto, T., IEEE Photonics J. 6, 1 (2014).CrossRefGoogle Scholar
Zayets, V., Saito, H., Yuasa, S., Ando, K., J. Appl. Phys. 111, 023103 (2012).CrossRefGoogle Scholar
Zayets, V., Saito, H., Ando, K., Yuasa, S., Materials 5, 857 (2012).CrossRefGoogle Scholar
Zayets, V., Saito, H., Yuasa, S., Proc. IEEE 7th Int. Conf. Nanomater. Appl. Prop. (NAP) (2017), 04NESP17–1.Google Scholar
Baryshev, A.V., Merzlikin, A.M., J. Opt. Soc. Am. B 33, 1399 (2016).CrossRefGoogle Scholar
Armelles, G., Cebollada, A., García-Martín, A., González, M.U., Adv. Opt. Mater. 1, 10 (2013).CrossRefGoogle Scholar
Zayets, V., Saito, H., Ando, K., Yuasa, S., Opt. Express 23, 12834 (2015).CrossRefGoogle Scholar
Zayets, V., Saito, H., Yuasa, S., Ando, K., Opt. Lett. 35, 931 (2010).CrossRefGoogle Scholar
Ignatov, A.I., Merzlikin, A.M., Baryshev, A.V., Zablotskiy, A.V., Kuzin, A.A., Opt. Commun. 359, 353 (2016).CrossRefGoogle Scholar
Kaihara, T., Ando, T., Shimizu, H., Zayets, V., Saito, H., Ando, K., Yuasa, S., Opt. Express 23, 11537 (2015).CrossRefGoogle Scholar
Kaihara, T., Shimizu, H., Cebollada, A., Armelles, G., Appl. Phys. Lett. 109, 111102 (2016).CrossRefGoogle Scholar
Zaets, W., Ando, K., IEEE Photonics Technol. Lett. 11, 1012 (1999).CrossRefGoogle Scholar
Shimizu, H., Nakano, Y., Jpn. J. Appl. Phys. 43, L1561 (2004).CrossRefGoogle Scholar
Shimizu, H., Nakano, Y., J. Lightwave Technol. 24, 38 (2006).CrossRefGoogle Scholar
Shimizu, H., Nakano, Y., IEEE Photonics Technol. Lett. 19, 1973 (2007).CrossRefGoogle Scholar
Zayets, V., Ando, K., Appl. Phys. Lett. 86, 261105 (2005).CrossRefGoogle Scholar
Shimizu, H., Kono, Y., Goto, S., Mori, T., Appl. Phys. Express 4, 022201 (2011).CrossRefGoogle Scholar
Shimizu, H., Uehara, K., Tazawa, K., Sakanishi, S., Jpn. J. Appl. Phys. 51, 02BG02 (2010).CrossRefGoogle Scholar
Vanwolleghem, M., Van Parys, W., Van Thourhout, D., Baets, R., Lelarge, F., Gauthier-Lafaye, O., Thedrez, B., Wirix-Speetjens, R., Lagae, L., Appl. Phys. Lett. 85, 3980 (2004).CrossRefGoogle Scholar
Van Parys, W., Moeyersoon, B., Van Thourhout, D., Baets, R., Vanwolleghem, M., Dagens, B., Decobert, J., Gouezigou, O.L., Make, D., Vanheertum, R., Lagae, L., Appl. Phys. Lett. 88, 071115 (2006).CrossRefGoogle Scholar
Vanwolleghem, M., Van Parys, W., Gogol, P., Beauvillain, P., Baets, R., J. Opt. Soc. Am. B 24, 94 (2007).CrossRefGoogle Scholar
Amemiya, T., Shimizu, H., Nakano, Y., Hai, P.N., Yokoyama, M., Tanaka, M., Appl. Phys. Lett. 89, 021104 (2006).CrossRefGoogle Scholar
Amemiya, T., Shimizu, H., Hai, P.N., Yokoyama, M., Tanaka, M., Nakano, Y., Jpn. J. Appl. Phys. 46, 205 (2007).CrossRefGoogle Scholar
Amemiya, T., Shimizu, H., Yokoyama, M., Hai, P.N., Tanaka, M., Nakano, Y., Appl. Opt. 46, 5784 (2007).CrossRefGoogle Scholar
Amemiya, T., Ogawa, Y., Shimizu, H., Munekata, H., Nakano, Y., Appl. Phys. Express 1, 022002 (2008).CrossRefGoogle Scholar
Zayets, V., Ando, K., IEEE Photonics Technol. Lett. 13, 185 (2001).CrossRefGoogle Scholar
Kaihara, T., Shimizu, H., Opt. Express 25, 730 (2017).CrossRefGoogle Scholar
Shimizu, H., Shimodaira, T., Jpn. J. Appl. Phys. 57, 04FN07 (2018).CrossRefGoogle Scholar