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Relationship between domain structure and film thickness in epitaxial PbTiO3 films deposited on MgO(001) by reactive sputtering

Published online by Cambridge University Press:  31 January 2011

Won Kyoung Choi ,
Si Kyoung Choi  and
Hyuck Mo Lee
Won Kyoung Choi
Affiliation:
Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Kusung-Dong 373–1, Yusung-Gu, Taejon, Korea 305–701
Si Kyoung Choi
Affiliation:
Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Kusung-Dong 373–1, Yusung-Gu, Taejon, Korea 305–701
Hyuck Mo Lee
Affiliation:
Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Kusung-Dong 373–1, Yusung-Gu, Taejon, Korea 305–701
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Abstract

The epitaxial PbTiO3 thin films of different thickness were prepared on MgO(001) substrates by the reactive direct-current magnetron sputtering. The volume fraction of c domains, α, which was measured by x-ray diffractometry, increased rapidly from zero with the film thickness, being saturated at about 90% above 100 nm. The films were annealed in a PbO atmosphere at 700 °C for 8 h, and they were used to study the composition change in the Pb/(Pb + Ti) ratio and the relaxation of the residual intrinsic stress. The relationship between change of α and composition was weak. The stress state was calculated through the finite-element method. As for the small thickness, the tensile epitaxial stress overwhelmed compressive intrinsic and thermal stresses, and the domain structure was a-domain oriented. As for the large thickness, the compressive intrinsic stress together with the thermal stress overcame the tensile epitaxial stress, and the population turned into c domain.

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Articles
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Journal of Materials Research , Volume 14 , Issue 12 , December 1999 , pp. 4677 - 4684
Copyright
Copyright © Materials Research Society 1999

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