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Pulsed plasmas study of linear antennas microwave CVD system for nanocrystalline diamond film growth

Published online by Cambridge University Press:  23 November 2011

Jan Vlcek ,
Frantisek Fendrych ,
Andrew Taylor ,
Michal Novotny  and
Michael Liehr
Jan Vlcek
Affiliation:
Department of Physics and Measurement, Institute of Chemical Technology Prague, CZ-16628 Prague 6, Czech Republic
Frantisek Fendrych*
Affiliation:
Institute of Physics, Academy of Sciences of the Czech Republic, CZ-18221 Prague 8, Czech Republic
Andrew Taylor
Affiliation:
Institute of Physics, Academy of Sciences of the Czech Republic, CZ-18221 Prague 8, Czech Republic
Michal Novotny
Affiliation:
Institute of Physics, Academy of Sciences of the Czech Republic, CZ-18221 Prague 8, Czech Republic
Michael Liehr
Affiliation:
Technical Consulting, D-63654 Buedingen, Germany
*
a)Address all correspondence to this author. e-mail: fendrych@fzu.cz
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Abstract

Optical emission spectroscopy (OES) was used to study plasmas generated by a novel plasma-enhanced linear antennas microwave chemical vapor deposition system for nanocrystalline diamond (NCD) growth in gas mixtures of H2 + CH4 + CO2. Atomic hydrogen intensities were investigated for pulsed plasmas and continuous wave (CW) mode plasmas. OES was used to study the effect of pressure (0.38–2 mbar), microwave pulse frequency (3.8–25 kHz), and total gas flow (125–1000 sccm). By using the Boltzmann plot for atomic hydrogen line intensities, plasma electron temperatures for pulsed and CW plasmas were calculated. During experiments, NCD films were deposited, which were investigated by secondary electron microscopy and Raman spectroscopy in terms of surface crystalline morphology and nondiamond carbon content. NCD films produced in high pulse frequency plasmas show low sp2 content (less than 5%) and homogenous crystalline structure with only a small amount of crystalline defects.

Keywords

Plasma-enhanced chemical vapor depositionDiamondOptical properties

Information

Type
Articles
Information
Journal of Materials Research , Volume 27 , Issue 5: Focus Issue: Plasma and Ion-Beam Assisted Materials Processing , 14 March 2012 , pp. 863 - 867
Copyright
Copyright © Materials Research Society 2011

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References

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