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Ion beam enhanced thermal depolymerization of poly(methyl methacrylate)

Published online by Cambridge University Press:  26 July 2012

M. E. Fragalà ,
G. Compagnini  and
O. Puglisi
M. E. Fragalà
Affiliation:
Dipartimento di Scienze Chimiche dell’ Università di Catania, Viale A.Doria, 6-95125 Catania, Italy
G. Compagnini
Affiliation:
Dipartimento di Scienze Chimiche dell’ Università di Catania, Viale A.Doria, 6-95125 Catania, Italy
O. Puglisi
Affiliation:
Dipartimento di Scienze Chimiche dell’ Università di Catania, Viale A.Doria, 6-95125 Catania, Italy
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Extract

Ion beam enhanced thermal depolymerization of poly(methyl methacrylate) thin films, 1–2 µm thick, has been studied in the temperature range 100–400 °C using a 300 keV He+ beam at very low fluence (5 × 1010−5 × 1011 ions cm−2). A relevant monomer evolution (mass signal m/z = 100) at temperature (150 °C) well below the conventional degradation temperature (360 °C) has been detected during irradiation. The observed phenomenon is discussed in terms of activation energies and diffusion processes within the investigated films. The possibility offered by this phenomenon of performing a microlithography process in only one step is discussed.

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Journal of Materials Research , Volume 14 , Issue 1 , January 1999 , pp. 228 - 231
Copyright
Copyright © Materials Research Society 1999

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