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Enhanced crystallization and phase transformation of amorphous silicon nitride under high pressure

Published online by Cambridge University Press:  31 January 2011

Ya-Li Li ,
Yong Liang ,
Fen Zheng ,
Xian-Feng Ma ,
Suo-Jing Cui  and
Liling Sun
Ya-Li Li*
Affiliation:
Institute of Metal Research, Chinese Academy of Sciences, 72 Wenhua Road, Shenyang 110015, People's Republic of China
Yong Liang
Affiliation:
Institute of Metal Research, Chinese Academy of Sciences, 72 Wenhua Road, Shenyang 110015, People's Republic of China
Fen Zheng
Affiliation:
Institute of Metal Research, Chinese Academy of Sciences, 72 Wenhua Road, Shenyang 110015, People's Republic of China
Xian-Feng Ma
Affiliation:
Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, 159 Renming Street, Changchun 130022, People's Republic of China
Suo-Jing Cui
Affiliation:
Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, 159 Renming Street, Changchun 130022, People's Republic of China
Liling Sun
Affiliation:
Institute of Physics, Chinese Academy of Sciences, Bejing 100080, People's Republic of China
*
e-mail: yalili@nirim.go.jp
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Abstract

The crystallization and phase transformation of amorphous Si3N4 ceramics under high pressure (1.0–5.0 GPa) between 800 and 1700 °C were investigated. A greatly enhanced crystallization and α–β transformation of the amorphous Si3N4 ceramics were evident under the high pressure, as characterized by that, at 5.0 GPa, the amorphous Si3N4 began to crystallize at a temperature as low as 1000 °C (to transform to a modification). The subsequent a–b transformation occurred completed between 1350 and 1420 °C after only 20 min of pressing at 5.0 GPa. In contrast, under 0.1 MPa N2, the identical amorphous materials were stable up to 1400 °C without detectable crystallization, and only a small amount of a phase was detected at 1500 °C. The crystallization temperature and the a–b transformation temperatures are reduced by 200–350 °C compared to that at normal pressure. The enhanced phase transformations of the amorphous Si3N4 were discussed on the basis of thermodynamic and kinetic consideration of the effects of pressure on nucleation and growth.

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Articles
Information
Journal of Materials Research , Volume 16 , Issue 1 , January 2001 , pp. 67 - 75
Copyright
Copyright © Materials Research Society 2001

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