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Electron emission from chemical vapor deposited diamond and amorphous carbon films observed with a simple field emission device

Published online by Cambridge University Press:  03 March 2011

Z. Feng ,
I.G. Brown  and
J.W. Ager III
Z. Feng
Affiliation:
Lawrence Berkeley Laboratory, University of California, Berkeley, California 94720
I.G. Brown
Affiliation:
Lawrence Berkeley Laboratory, University of California, Berkeley, California 94720
J.W. Ager III
Affiliation:
Lawrence Berkeley Laboratory, University of California, Berkeley, California 94720
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Abstract

Electron emission from chemical vapor deposited (CVD) diamond and amorphous carbon (a-C) films was observed with a simple field emission device (FED). Both diamond and a-C films were prepared with microwave plasma-enhanced CVD techniques. Electron emission in the ficld strength range + 10 to −10 MVm−1 was studied, and the field emission source was confirmed by a diode characteristic of the I-V curve, a straight line in the Fowler-Nordheim (F-N) plot, and direct observation of light emission from a fluorescent screen. The turn-on field strength was ∼5 MVm−1, which was similar for both kinds of carbon films. The highest current density for diamond films, observed at a field strength of 10 MVm−1, was ∼15 μA cm−2. Diamond films yielded a higher emission current than a-C films. The reasons for the observed field emission are discussed.

Type
Rapid Communication
Information
Journal of Materials Research , Volume 10 , Issue 7 , July 1995 , pp. 1585 - 1588
Copyright
Copyright © Materials Research Society 1995

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References

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