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Effect of radio frequency sputtering power on W–TiO2 nanotubes to improve photoelectrochemical performance

Published online by Cambridge University Press:  25 May 2012

Chin Wei Lai ,
Srimala Sreekantan  and
Pei San E
Chin Wei Lai
Affiliation:
School of Materials and Mineral Resources Engineering, Universiti Sains Malaysia Engineering Campus, 14300 Nibong Tebal, Seberang Perai Selatan, Pulau Pinang, Malaysia, 14300
Srimala Sreekantan*
Affiliation:
School of Materials and Mineral Resources Engineering, Universiti Sains Malaysia Engineering Campus, 14300 Nibong Tebal, Seberang Perai Selatan, Pulau Pinang, Malaysia, 14300
Pei San E
Affiliation:
School of Materials and Mineral Resources Engineering, Universiti Sains Malaysia Engineering Campus, 14300 Nibong Tebal, Seberang Perai Selatan, Pulau Pinang, Malaysia, 14300
*
a)Address all correspondence to this author. e-mail: srimala@eng.usm.my
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Abstract

The present study aims to determine the optimum radio frequency (RF) sputtering power to obtain the desired W–TiO2 nanotubes for the best photoelectrochemical (PEC) performance. Tungsten (W) was deposited on titania (TiO2) nanotube arrays via RF sputtering technique under different sputtering powers from 50 to 250 W. The optimum content of W on TiO2 nanotube arrays play a significant role in maximizing the photocurrent generation efficiency to promote charge separation by accumulation of photogenerated electrons. The sputtering power below 180 W exhibited high-ordered and unbroken TiO2 nanotube arrays. However, the sputtering power over 180 W exhibited broken nanotube arrays and an oxide layer was formed due to the impact of high energy ions accelerated by a high sputtering power. The TiO2 nanotube arrays sputtered with tungsten at 50 W showed a better photocurrent density (1.55 mA/cm2), with a photoconversion efficiency of 2.2% in the PEC performance among the samples due to the effective charge separation and reduced recombination center in the resultant W–TiO2 nanotubes.

Keywords

Titania nanotubesanodizationTungsten trioxideradio frequency sputteringphotoelectrochemical

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Type
Articles
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Journal of Materials Research , Volume 27 , Issue 13 , 14 July 2012 , pp. 1695 - 1704
Copyright
Copyright © Materials Research Society 2012

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