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Atomic force microscope investigation of the thermal stability of thin TiSi2 films

Published online by Cambridge University Press:  31 January 2011

Alberto V. Amorsolo Jr. ,
Paul D. Funkenbusch  and
Alan M. Kadin
Alberto V. Amorsolo Jr.
Affiliation:
Department of Mechanical Engineering, University of Rochester, Rochester, New York 14627
Paul D. Funkenbusch
Affiliation:
Department of Mechanical Engineering, University of Rochester, Rochester, New York 14627
Alan M. Kadin
Affiliation:
Department of Electrical Engineering, University of Rochester, Rochester, New York 14627
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The thermal stability of TiSi2 films on Si has been studied using the atomic force microscope (AFM). Changes in the surface roughness, film morphology, and sheet resistance were monitored during a series of rapid thermal annealing treatments. A linear increase of the root-mean-square (rms) roughness with time was observed during the early stages of degradation, in agreement with a surface diffusion model of thermal grooving, followed by an apparent saturation roughness that was attributed to the effective rupture of the film.

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Journal of Materials Research , Volume 13 , Issue 7 , July 1998 , pp. 1938 - 1949
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Copyright © Materials Research Society 1998

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