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Ion beam mixing, diffusion, and phase stability in Cu/Al2O3 interfaces

Published online by Cambridge University Press:  31 January 2011

K. Neubeck ,
H. Hahn ,
A. G. Balogh ,
H. Baumann ,
K. Bethge ,
D. M. Rück  and
N. Angert
K. Neubeck
Affiliation:
Department of Materials Science, Technical University, Darmstadt, Germany
H. Hahn
Affiliation:
Department of Materials Science, Technical University, Darmstadt, Germany
A. G. Balogh
Affiliation:
Department of Materials Science, Technical University, Darmstadt, Germany
H. Baumann
Affiliation:
Institut für Kernphysik, J. W. Goethe Universität, Frankfurt am Main, Germany
K. Bethge
Affiliation:
Institut für Kernphysik, J. W. Goethe Universität, Frankfurt am Main, Germany
D. M. Rück
Affiliation:
Institute for Heavy Ion Research (GSI), Darmstadt, Germany
N. Angert
Affiliation:
Institute for Heavy Ion Research (GSI), Darmstadt, Germany
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Abstract

Ion beam mixing, diffusion properties, and phase stability have been investigated in Cu/Al2O3 bilayer samples. Specimens were prepared by vapor deposition and irradiated with 150 keV Ar+ ions up to a fluence of 1.5 · 1017 Ar+/cm2. Sample temperature under irradiation was varied between 77 K and 673 K. The mixing behavior was studied by analyzing the concentration depth profiles, determined by Rutherford Backscattering Spectroscopy. It was found that mixing efficiencies of Cu, Al, and O scale with Ar+ fluence. Radiation enhanced diffusion (RED), observed above room temperature, is separated from ballistic mixing and high temperature diffusion. The migration enthalpy for interdiffusion in the RED region (between RT and 300 °C) was estimated to be approximately 0.3 eV. Sputtering yields depending on temperature gradient near to sample and phase stability versus ion dose and temperature are also discussed.

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Type
Articles
Information
Journal of Materials Research , Volume 11 , Issue 5 , May 1996 , pp. 1277 - 1283
Copyright
Copyright © Materials Research Society 1996

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References

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