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Ion beam energy dependence of surface and structural properties of amorphous carbon films deposited by IBSD method on Ni–Cu alloy

Published online by Cambridge University Press:  14 February 2017

Elham Mohagheghpour ,
Marjan Rajabi ,
Reza Gholamipour ,
Majid M. Larijani  and
Shahab Sheibani
Elham Mohagheghpour
Affiliation:
Department of Advanced Materials and Renewable Energy, Iranian Research Organization for Science and Technology, Tehran 33535111, Iran
Marjan Rajabi*
Affiliation:
Department of Advanced Materials and Renewable Energy, Iranian Research Organization for Science and Technology, Tehran 33535111, Iran
Reza Gholamipour*
Affiliation:
Department of Advanced Materials and Renewable Energy, Iranian Research Organization for Science and Technology, Tehran 33535111, Iran
Majid M. Larijani
Affiliation:
Radiation Application Research School, Nuclear Sciences and Technology Institute, Tehran 14395836, Iran
Shahab Sheibani
Affiliation:
Radiation Application Research School, Nuclear Sciences and Technology Institute, Tehran 14395836, Iran
*
a) Address all correspondence to these authors. e-mail: mrajabi@irost.ir
b) e-mail: rgholamipour@gmail.com
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Abstract

The amorphous carbon thin films were deposited by the ion beam sputtering deposition technique on Ni–Cu alloy substrates. The effect of sputtering ion beam energy on wettabillity, surface, and structural properties of thin films was examined. The sputtering ion beam energy was varied over a wide range from 2 to 5 keV. Raman spectra showed that the values of I D/I G ratio and the ‘G’ peak position have a reduction trend by increasing the argon ion beam energy while the surface roughness increased due to the resputtering effect. The wettability and surface energy of a-C carbon films were studied by contact angle measurements in relation to structure and topography. The deposited films showed a relatively high water contact angle (CA) that decreases from 87° to 75°. The X-ray photoelectron spectroscopy showed that the value of sp 3/sp 2 bond content of a-C thin films deposited with the highest argon ion beam energy of 5 keV was about 0.8. Furthermore, the optical band gap followed similar trends of the structural properties.

Keywords

amorphous carbon (a-C)ion beam sputtering depositionion beam energysurface energywettability

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Articles
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Journal of Materials Research , Volume 32 , Issue 7 , 14 April 2017 , pp. 1258 - 1266
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Copyright © Materials Research Society 2017 

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Footnotes

Contributing Editor: Jürgen Eckert

References

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