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Atomic force microscope investigation of the thermal stability of thin TiSi2 films

Published online by Cambridge University Press:  31 January 2011

Alberto V. Amorsolo Jr. ,
Paul D. Funkenbusch  and
Alan M. Kadin
Alberto V. Amorsolo Jr.
Affiliation:
Department of Mechanical Engineering, University of Rochester, Rochester, New York 14627
Paul D. Funkenbusch
Affiliation:
Department of Mechanical Engineering, University of Rochester, Rochester, New York 14627
Alan M. Kadin
Affiliation:
Department of Electrical Engineering, University of Rochester, Rochester, New York 14627
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Extract

The thermal stability of TiSi2 films on Si has been studied using the atomic force microscope (AFM). Changes in the surface roughness, film morphology, and sheet resistance were monitored during a series of rapid thermal annealing treatments. A linear increase of the root-mean-square (rms) roughness with time was observed during the early stages of degradation, in agreement with a surface diffusion model of thermal grooving, followed by an apparent saturation roughness that was attributed to the effective rupture of the film.

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Articles
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Journal of Materials Research , Volume 13 , Issue 7 , July 1998 , pp. 1938 - 1949
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Copyright © Materials Research Society 1998

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